Klorin trifluorida

Klorin trifluorida
Skeletal formula of chlorine trifluoride with some measurements
Skeletal formula of chlorine trifluoride with some measurements
Spacefill model of chlorine trifluoride
Spacefill model of chlorine trifluoride
Nama
Nama IUPAC (sistematis)
Trifluoro-λ3-chlorane[1] (substitutive)
Nama lain
Chlorotrifluoride
Penanda
Model 3D (JSmol)
3DMet {{{3DMet}}}
ChEBI
ChemSpider
Nomor EC
Referensi Gmelin 1439
MeSH chlorine+trifluoride
Nomor RTECS {{{value}}}
Nomor UN 1749
  • InChI=1S/ClF3/c2-1(3)4 YaY
    Key: JOHWNGGYGAVMGU-UHFFFAOYSA-N YaY
  • InChI=1/ClF3/c2-1(3)4
    Key: JOHWNGGYGAVMGU-UHFFFAOYAB
  • F[Cl](F)F
  • [F-].[F-].F[Cl++]
Sifat
ClF3
Massa molar 92,45 g·mol−1
Penampilan Colorless gas or greenish-yellow liquid
Bau sweet, pungent, irritating, suffocating[2][3]
Densitas 3.779 g/L[4]
Titik lebur −7.634 °C (−13.709 °F; −7.361 K)[4]
Titik didih 1.175 °C (2.147 °F; 1.448 K)[4] (decomposes @ 180 °C (356 °F; 453 K))
Exothermic hydrolysis[5]
Kelarutan Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane.[5] Soluble in CCl4 but can be explosive in high concentrations.
Tekanan uap 175 kPa
-26.5·10−6 cm3/mol[6]
Viskositas 91.82 μPa s
Struktur
T-shaped
Termokimia[7]
Kapasitas kalor (C) 63.9 J K−1mol−1
Entropi molar standar (So) 281.6 J K−1mol−1
Entalpi pembentukan standar (ΔfHo) −163.2 kJ mol−1
Energi bebas Gibbs (ΔfG) −123.0 kJ mol−1
Bahaya
Bahaya utama explosive when exposed to organics, reacts violently with water[3]
Lembar data keselamatan natlex.ilo.ch
Piktogram GHS GHS03: Oksidator GHS05: Korosif GHS06: Beracun GHS08: Bahaya Kesehatan
Keterangan bahaya GHS {{{value}}}
Titik nyala noncombustible [3]
Dosis atau konsentrasi letal (LD, LC):
95 ppm (rat, 4 hr)
178 ppm (mouse, 1 hr)
230 ppm (monkey, 1 hr)
299 ppm (rat, 1 hr)
[8]
Batas imbas kesehatan AS (NIOSH):
PEL (yang diperbolehkan)
 C 0.1 ppm (0.4 mg/m3)[3]
REL (yang direkomendasikan)
 C 0.1 ppm (0.4 mg/m3)[3]
IDLH (langsung berbahaya)
 20 ppm[3]
Senyawa terkait
Senyawa terkait
 Chlorine pentafluoride

Chlorine monofluoride
Bromine trifluoride
Iodine trifluoride

Kecuali dinyatakan lain, data di atas berlaku pada suhu dan tekanan standar (25 °C [77 °F], 100 kPa).
YaY verifikasi (apa ini YaYN ?)
Referensi

Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF3. Senyawa ini berwujud gas tak berwarna, beracun, korosif, dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF3 berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket, berbagai proses di industri semikonduktor,[9][10][11] pengolahan bahan bakar nuklir,,[12] serta proses-proses industri lainnya.[13]

Referensi

  1. ^ "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011. 
  2. ^ ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.
  3. ^ a b c d e f "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH). 
  4. ^ a b c Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9. 
  5. ^ a b Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine. at Guidechem Chemical Network
  6. ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9. 
  7. ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9. 
  8. ^ "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH). 
  9. ^ Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391. 
  10. ^ Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"
  11. ^ Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4. publikasi akses terbuka - bebas untuk dibuka
  12. ^ Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9.  (available from National Academies Presspublikasi akses terbuka - bebas untuk dibuka)
  13. ^ Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"