Phonon scatteringPhonons can scatter through several mechanisms as they travel through the material. These scattering mechanisms are: Umklapp phonon-phonon scattering, phonon-impurity scattering, phonon-electron scattering, and phonon-boundary scattering. Each scattering mechanism can be characterised by a relaxation rate 1/ which is the inverse of the corresponding relaxation time. All scattering processes can be taken into account using Matthiessen's rule. Then the combined relaxation time can be written as: The parameters , , , are due to Umklapp scattering, mass-difference impurity scattering, boundary scattering and phonon-electron scattering, respectively. Phonon-phonon scatteringFor phonon-phonon scattering, effects by normal processes (processes which conserve the phonon wave vector - N processes) are ignored in favor of Umklapp processes (U processes). Since normal processes vary linearly with and umklapp processes vary with , Umklapp scattering dominates at high frequency.[1] is given by: where is the Gruneisen anharmonicity parameter, μ is the shear modulus, V0 is the volume per atom and is the Debye frequency.[2] Three-phonon and four-phonon processThermal transport in non-metal solids was usually considered to be governed by the three-phonon scattering process,[3] and the role of four-phonon and higher-order scattering processes was believed to be negligible. Recent studies have shown that the four-phonon scattering can be important for nearly all materials at high temperature [4] and for certain materials at room temperature.[5] The predicted significance of four-phonon scattering in boron arsenide was confirmed by experiments. Mass-difference impurity scatteringMass-difference impurity scattering is given by: where is a measure of the impurity scattering strength. Note that is dependent of the dispersion curves. Boundary scatteringBoundary scattering is particularly important for low-dimensional nanostructures and its relaxation rate is given by: where is the characteristic length of the system and represents the fraction of specularly scattered phonons. The parameter is not easily calculated for an arbitrary surface. For a surface characterized by a root-mean-square roughness , a wavelength-dependent value for can be calculated using where is the angle of incidence.[6] An extra factor of is sometimes erroneously included in the exponent of the above equation.[7] At normal incidence, , perfectly specular scattering (i.e. ) would require an arbitrarily large wavelength, or conversely an arbitrarily small roughness. Purely specular scattering does not introduce a boundary-associated increase in the thermal resistance. In the diffusive limit, however, at the relaxation rate becomes This equation is also known as Casimir limit.[8] These phenomenological equations can in many cases accurately model the thermal conductivity of isotropic nano-structures with characteristic sizes on the order of the phonon mean free path. More detailed calculations are in general required to fully capture the phonon-boundary interaction across all relevant vibrational modes in an arbitrary structure. Phonon-electron scatteringPhonon-electron scattering can also contribute when the material is heavily doped. The corresponding relaxation time is given as: The parameter is conduction electrons concentration, ε is deformation potential, ρ is mass density and m* is effective electron mass.[2] It is usually assumed that contribution to thermal conductivity by phonon-electron scattering is negligible [citation needed]. See alsoReferences
|